R. Puthenkovilakam: search on Z-Library

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1

Dielectric property and thermal stability of HfO[sub 2] on silicon

Y. Lin, R. Puthenkovilakam, J. P. Chang

Journal:

Applied Physics Letters

Year:

2002

Language:

english

File:

PDF, 243 KB

english, 2002

2

Interfacial properties of ZrO[sub 2] on silicon

Lin, Y.-S., Puthenkovilakam, R., Chang, J. P., Bouldin, C., Levin, I., Nguyen, N. V., Ehrstein, J., Sun, Y., Pianetta, P., Conard, T., Vandervorst, W., Venturo, V., Selbrede, S.

Journal:

Journal of Applied Physics

Year:

2003

Language:

english

File:

PDF, 733 KB

english, 2003

3

interfaces

Puthenkovilakam, Ragesh, Carter, Emily A., Chang, Jane P.

Journal:

Physical Review B

Year:

2004

Language:

english

File:

PDF, 559 KB

english, 2004

4

Effect of nitrogen on the electronic properties of hafnium oxynitrides

Choi, J., Puthenkovilakam, R., Chang, J. P.

Journal:

Journal of Applied Physics

Year:

2006

Language:

english

File:

PDF, 501 KB

english, 2006

5

An accurate determination of barrier heights at the HfO[sub 2]∕Si interfaces

Puthenkovilakam, Ragesh, Chang, Jane P.

Journal:

Journal of Applied Physics

Year:

2004

Language:

english

File:

PDF, 846 KB

english, 2004

6

Band structure and alignment of the AlN∕SiC heterostructure

J. Choi, R. Puthenkovilakam, J. P. Chang

Year:

2005

Language:

english

File:

PDF, 458 KB

english, 2005

7

Effects of post–deposition annealing on the material characteristics of ultrathin HfO[sub 2] films on silicon

Puthenkovilakam, R., Lin, Y. -S., Choi, J., Lu, J., Blom, H.-O., Pianetta, P., Devine, D., Sendler, M., Chang, J. P.

Journal:

Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 762 KB

english, 2005

8

Valence band structure and band alignment at the ZrO[sub 2]/Si interface

Puthenkovilakam, Ragesh, Chang, Jane P.

Journal:

Applied Physics Letters

Year:

2004

Language:

english

File:

PDF, 466 KB

english, 2004

9

Electrical characteristics of postdeposition annealed HfO[sub 2] on silicon

Puthenkovilakam, Ragesh, Sawkar, Monica, Chang, Jane P.

Journal:

Applied Physics Letters

Year:

2005

Language:

english

File:

PDF, 243 KB

english, 2005

10

Ion-enhanced chemical etching of HfO[sub 2] for integration in metal–oxide–semiconductor field effect transistors

Sha, Lin, Puthenkovilakam, Ragesh, Lin, You-Sheng, Chang, Jane P.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2003

Language:

english

File:

PDF, 450 KB

english, 2003

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